PELCO® 35nm Silicon Nitride Support Films for TEM Aluminum Asbestos Reference Index 3 Grid

Asbestos Reference Index 3 Grid

The TiOx substrate is more bio-compatible and can also be used for life-science applications

each with a different spring constant

conductive silicon minimizes charging during sample preparation and TEM imaging

Sheet resistance: 0

PELCO® 35nm Silicon Nitride Support Films for TEM Aluminum Asbestos Reference Index 3 GridDESCRIPTION PRODUCT SPECIFICATIONS 35nm membrane thickness 25 apertures 200m frame thickness 21515 10 Silicon Nitride Support Film, 35nm, 70x70m Aperture (25) on 0. 5 x 0. 5mm Window pkg 10 Defining parameters for the PELCO Silicon Nitride Support Films are: Film Thickness: Resilient, ultra low stress 8, 15, 35 or 50nm giving rise to minimum absorption to enable clear imaging; robust, low stress 200nm for better handling and use on multiple platforms;